November 18, 2020. 1:00PM CT.
In this iteration of our CDMC Conversation Series, CDMC Visiting Executive Director Sarah Anne Carter conversed with Diné (Navajo) artist and scholar, Dakota Mace. A graduate of the University of Wisconsin–Madison and the Institute of American Indian Arts, Mace is a photographer and textile artist. Her art and research focuses on appropriation of Indigenous design-work. Mace is currently a lecturer in photography at UW–Madison and the photographer for the CDMC. Her work with the CDMC has also included piloting cultural appropriation workshops and co-curating Intersections: Indigenous Textiles of the Americas.
Event was free and open to the public thanks to the support of The Anonymous Fund.
This event has passed; but you may still listen to the conversation via the video below.
